ASML, a leading manufacturer of lithography machines, is developing the next generation of lithography called high-numerical-aperture EUV lithography. This technology is essential for keeping pace with Moore’s Law, which requires continual improvement in resolution of photolithography. Photolithography resolution has improved 10,000-fold in the last four decades by reducing wavelength, increasing numerical aperture, and improving processing techniques. The switch to extreme-ultraviolet (EUV) lithography from 193-nanometer light allowed for smaller feature sizes, but now it’s time to boost the numerical aperture from 0.33 to 0.55. ASML’s high-NA system uses anamorphic optics and increased demagnification to overcome the challenge of reflective angles. High-NA EUV lithography is set to be ready for commercial use in 2025.
https://spectrum.ieee.org/high-na-euv