Canon has developed nanoimprint lithography technology capable of producing advanced silicon chips with logic chips similar to those produced by Intel, AMD, and Nvidia. This technology is a cheaper and simpler alternative to extreme ultraviolet (EUV) lithography scanners dominating the industry. Nano-imprint lithography involves using a master mask to create replica masks that are stamped onto a wafer covered in a liquid resin. Despite taking 20 years to develop, Canon’s NIL system is now available commercially and offers lower ownership costs and higher efficiency compared to EUV lithography. The company aims to produce high-resolution masks for memory chips and logic devices by 2028, potentially providing a competitive alternative to EUV technology.
https://spectrum.ieee.org/nanoimprint-lithography